Check out the RUGIPO Cut Off Mark 2021 2021/2022 (JAMB And Departmental), recently released by the school management.
RUGIPO Post-UTME form, cut-off mark, eligibility, application, fee, deadline, screening and registration details of the 2021/2022 Academic Session have been announced. Cut-off mark is 120. Application fee is N2000. Screening will hold October 8th -11th, 2021. See full details below.
This is to invite all candidates who applied for admission to the Rufus Giwa Polytechnic, Owo during the 2021 Unified Tertiary Matriculation Examination (UTME) conducted by the Joint Admissions and Matriculation Board (JAMB) and those who wrote the examination and now wish to secure admission into the Polytechnic that they should register on-line for screening exercise for the 2021/2022 Academic Session.
The applicants are also enjoined to note that only candidates who scored 120 marks and above are qualified to apply for admission.
Method Of Application
Candidates are enjoined to visit the Portal of the Polytechnic (sf.rugipo.edu.ng) for further information and register after paying through UNIFIED PAYMENTS PLATFORM with the use of master card or verve card in any Commercial Bank throughout the country for Screening fee, Administrative fee and portal fee to access the Website with effect from Thursday, 11th July, 2021.
Meanwhile, the screening fee is Two Thousand Naira (₦2,000.00) only. Applicants for the screening exercise are also requested to upload the following items of information:
(i) JAMB Data (with score)
(ii) Ordinary Level results (WAEC, NECO, GCE and NABTEB)
(iii) Passport photograph
(iv) Candidates are also to upload their ‘O’level result(s) on JAMB CAPS before final consideration for admission
Candidates are advised to print their admission screening forms and the dates for their Post- UTME tests on or before 3rd October, 2021.
The screening exercise shall hold between 8th and 11th October, 2021.
Feel free to share the RUGIPO Cut Off Mark (JAMB And Departmental) 2021/2022, recently released by the school management.